The new PECS II system is the answer to challenges in SEM specimen preparation such as:
Debris and contamination from mechanical or electrochemical polishing
Large surface areas
Need for clean and uniform coating after polish, without breaking vacuum
Minimize preferential etching due to sample chemistry or hardness differences
The new PECS II features:
Low energy (range: 0.1 to 8.0 keV) ion polishing leaves neither debris nor contamination (minimal Ar ion implantation)
Large surface areas, up to 4 mm (yes, 4,000 µm!) radius
Polish and coat with a single pump down
No mechanical deformation, no chemical reactions, minimum preferential etching thanks to low glancing angle (±10°)
Options for liquid nitrogen cooling and digital zoom camera
The new PECS II is ideal for applications where a smooth, clean, uniform surface is essential:
EBSD mapping
Cathodoluminescence experiments
Minimize topography contrast on cross sections
Materials sensitive to oxygen or humidity
Ready to go from here…
Please contact us if you wish to send a sample and try the new features and possibilities offered by the PECS II
New and exciting experiments are now possible thanks to the high quality of surface finish provided by this tool!