Electron Microscopy uses electrons instead of photons to create a high-resolution image of a sample. In Scanning Electron Microscopes (SEMs) the electrons are focused on a narrow beam that is scanned over the surface of the specimen to obtain information down to the nanometer scale. SEMs are also sometimes coupled with other types of particle beams such as Ga and Xe plasma Focused Ion Beams (FIBs). SEMs offer the ultrahigh resolution and versatility that empower today's microscopists to image and characterize a new generation of nanomaterials, capture biological details, analyze forensic evidence, create nanopatterns, and pinpoint problems in manufacturing processes.
Transmission Electron Microscopes (
We provide a wide range of SEMs and FIBs with a modular approach, where each electron or ion column can be mounted on up to 4 different chamber sizes (SB, LM, XM or GM). Additionally, each model comes in the high-vacuum version only (H) or the Univacuum version (U) capable of additionally operating in up to 500 Pa (optionally 2 000 Pa for some models) partial pressure of dry nitrogen or water vapor.
SCANNING ELECTRON MICROSCOPES (SEMs)
- VEGA3: Thermionic source SEMs, with either W or LaB6 emitter
- MIRA3: Field Emission SEMs, non-immersion lens
- MAIA3: Field Emission SEMs with
- S8000: 4th Generation Field Emission SEMs, non-immersion lens
DUAL BEAM FOCUSED ION BEAM - SCANNING ELECTRON MICROSCOPES (FIB-SEMs)
- LYRA3: Ga LMIS with FE-SEM,
- GAIA3: Ga LMIS with FE-SEM, immersion lens
- FERA3: Plasma FIB with FE-SEM,
- XEIA3: Plasma FIB with FE-SEM, immersion lens
- S8000G: UHR Ga FIB,
- S9000G: UHR Ga FIB,
- NanoSpace: Ultra-High Vacuum FIB